OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Adopting curvilinear shapes for production ILT: challenges and opportunities
Ryan Pearman, P. Jeffrey Ungar, Nagesh Shirali, et al.
(2019)
Closed Access | Times Cited: 9
Ryan Pearman, P. Jeffrey Ungar, Nagesh Shirali, et al.
(2019)
Closed Access | Times Cited: 9
Showing 9 citing articles:
逆向光刻工艺进展
王富天 Wang Futian, 魏娟 Wei Juan, 王翠香 Wang Cuixiang, et al.
Laser & Optoelectronics Progress (2024) Vol. 61, Iss. 21, pp. 2100001-2100001
Closed Access | Times Cited: 1
王富天 Wang Futian, 魏娟 Wei Juan, 王翠香 Wang Cuixiang, et al.
Laser & Optoelectronics Progress (2024) Vol. 61, Iss. 21, pp. 2100001-2100001
Closed Access | Times Cited: 1
Implicit function characterization of the curvilinear mask to realize parametric optical proximity correction with a neighborhood parallel tabu search
Pengzhi Wei, Yanqiu Li, Zhaoxuan Li, et al.
Applied Optics (2023) Vol. 62, Iss. 18, pp. 4848-4848
Closed Access | Times Cited: 3
Pengzhi Wei, Yanqiu Li, Zhaoxuan Li, et al.
Applied Optics (2023) Vol. 62, Iss. 18, pp. 4848-4848
Closed Access | Times Cited: 3
Inverse Lithography with Structured Sub-Resolution Assist Features
Xiaoxuan Liu, Jiale Liu, Wenjing He, et al.
(2024), pp. 535-539
Closed Access
Xiaoxuan Liu, Jiale Liu, Wenjing He, et al.
(2024), pp. 535-539
Closed Access
Efficient curvilinear optical proximity correction using non-uniform B-spline curves
Yang He, Yanqiu Li, Miao Yuan, et al.
Applied Optics (2024) Vol. 63, Iss. 34, pp. 8818-8818
Closed Access
Yang He, Yanqiu Li, Miao Yuan, et al.
Applied Optics (2024) Vol. 63, Iss. 34, pp. 8818-8818
Closed Access
Five deep learning recipes for the mask-making industry
Ajay Kumar Baranwal, Mike Meyer, Thang Nguyen, et al.
(2019), pp. 7-7
Closed Access | Times Cited: 3
Ajay Kumar Baranwal, Mike Meyer, Thang Nguyen, et al.
(2019), pp. 7-7
Closed Access | Times Cited: 3
Breakthrough curvilinear ILT enabled by multi-beam mask writing
Linyong Pang, E. Vidal Russell, Bill Baggenstoss, et al.
Journal of Micro/Nanopatterning Materials and Metrology (2021) Vol. 20, Iss. 04
Open Access | Times Cited: 3
Linyong Pang, E. Vidal Russell, Bill Baggenstoss, et al.
Journal of Micro/Nanopatterning Materials and Metrology (2021) Vol. 20, Iss. 04
Open Access | Times Cited: 3
Improvements on pattern fidelity at high curvature region of curvilinear mask with a novel method of MPC
Ai Kaneko, Taigo Fujii, Itaru Ono, et al.
(2023), pp. 49-49
Closed Access
Ai Kaneko, Taigo Fujii, Itaru Ono, et al.
(2023), pp. 49-49
Closed Access
Leaping into the curvy world with GPU accelerated O(p) computing
Abhishek Shendre, Aki Fujimura
(2023), pp. 10-10
Open Access
Abhishek Shendre, Aki Fujimura
(2023), pp. 10-10
Open Access
You do not need 1 nm contours for curvilinear shapes: pixel-based computing is the answer
Abhishek Shendre, Aki Fujimura, Mariusz Niewczas, et al.
Journal of Micro/Nanopatterning Materials and Metrology (2023) Vol. 23, Iss. 01
Closed Access
Abhishek Shendre, Aki Fujimura, Mariusz Niewczas, et al.
Journal of Micro/Nanopatterning Materials and Metrology (2023) Vol. 23, Iss. 01
Closed Access
