OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Oxygen Vacancy Modulation With TiO₂ Stack Interface Engineering for Ferroelectric Hf0.5Zr0.5O₂ Thin Films
Xuepei Wang, Maokun Wu, Boyao Cui, et al.
IEEE Electron Device Letters (2023) Vol. 45, Iss. 1, pp. 100-103
Closed Access | Times Cited: 6
Xuepei Wang, Maokun Wu, Boyao Cui, et al.
IEEE Electron Device Letters (2023) Vol. 45, Iss. 1, pp. 100-103
Closed Access | Times Cited: 6
Showing 6 citing articles:
Probing Hf0.5Zr0.5O2 Ferroelectricity: Neutron Reflectivity Reveals Critical Interface Effects
Hsing-Yang Chen, Chi-Lin Mo, Jing‐Jong Shyue, et al.
ACS Applied Materials & Interfaces (2025)
Closed Access
Hsing-Yang Chen, Chi-Lin Mo, Jing‐Jong Shyue, et al.
ACS Applied Materials & Interfaces (2025)
Closed Access
Ultrafast Switching Speed Demonstrated in Wafer-Scale Integration of Crystalline Undoped HfO2-Based Ferroelectrics
Zongwei Shang, Xiaomei Li, Changqing Ye, et al.
Nano Letters (2025)
Closed Access
Zongwei Shang, Xiaomei Li, Changqing Ye, et al.
Nano Letters (2025)
Closed Access
Strategies for Reducing Operating Voltage of Ferroelectric Hafnia by Decreasing Coercive Field and Film Thickness
Dong Han, Hyojun Choi, Dong Hyun Lee, et al.
Advanced Physics Research (2025)
Open Access
Dong Han, Hyojun Choi, Dong Hyun Lee, et al.
Advanced Physics Research (2025)
Open Access
Ultrathin Tio2-Interfaced Hafnia Ferroelectric Transistor for Large-Scale Neuromorphic Computing
Changhyeon Han, Ryun‐Han Koo, Wonjun Shin, et al.
(2025)
Closed Access
Changhyeon Han, Ryun‐Han Koo, Wonjun Shin, et al.
(2025)
Closed Access
Hafnium oxide-based nonvolatile ferroelectric memcapacitor array for high energy-efficiency neuromorphic computing
Xuepei Wang, S. Ye, Boyao Cui, et al.
Nano Energy (2025), pp. 111011-111011
Closed Access
Xuepei Wang, S. Ye, Boyao Cui, et al.
Nano Energy (2025), pp. 111011-111011
Closed Access
Unintended Soft Breakdown Mechanism Limiting Ultrathin Ferroelectric HZO Films Scaling
Wonwoo Kho, Hyunjoo Hwang, Hyo‐Bae Kim, et al.
ACS Applied Electronic Materials (2025)
Closed Access
Wonwoo Kho, Hyunjoo Hwang, Hyo‐Bae Kim, et al.
ACS Applied Electronic Materials (2025)
Closed Access
Exploring tungsten-oxygen vacancy synergy: Impact on leakage characteristics in Hf0.5Zr0.5O2 ferroelectric thin films
Xuepei Wang, Maokun Wu, Ting Zhang, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 23
Closed Access | Times Cited: 2
Xuepei Wang, Maokun Wu, Ting Zhang, et al.
Applied Physics Letters (2024) Vol. 124, Iss. 23
Closed Access | Times Cited: 2
Imprint-Correlated Retention Loss in Hf$_{\text{0}.\text{5}}$Zr$_{\text{0}.\text{5}}$O$_{\text{2}}$ Ferroelectric Thin Film Through Wide-Temperature Characterizations
Xiaopeng Li, Lu Tai, Pengpeng Sang, et al.
IEEE Transactions on Electron Devices (2024) Vol. 71, Iss. 9, pp. 5361-5366
Closed Access | Times Cited: 1
Xiaopeng Li, Lu Tai, Pengpeng Sang, et al.
IEEE Transactions on Electron Devices (2024) Vol. 71, Iss. 9, pp. 5361-5366
Closed Access | Times Cited: 1
