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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Atomic surface achieved through a novel cross-scale model from macroscale to nanoscale
Feng Zhao, Zhenyu Zhang, Xingqiao Deng, et al.
Nanoscale (2024) Vol. 16, Iss. 5, pp. 2318-2336
Closed Access | Times Cited: 22

Showing 22 citing articles:

A review on the development of ceria for chemical mechanical polishing
Jiahui Ma, Ning Xu, Jie Cheng, et al.
Powder Technology (2024) Vol. 444, pp. 119989-119989
Closed Access | Times Cited: 14
Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives
Xiaoxiao Zhu, Yuziyu Gui, Hao Fu, et al.
Tribology International (2024) Vol. 197, pp. 109827-109827
Closed Access | Times Cited: 10
Characterizing the contact evolution through the combination of surface roughness parameters in chemical mechanical polishing using a polyurethane polishing pad
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access | Times Cited: 1
Chemical-mechanical synergies effects of multi-purpose pH regulators on C-, A-, and R-plane sapphire polishing
Yida Zou, Xinhuan Niu, Ni Zhan, et al.
Tribology International (2024) Vol. 195, pp. 109603-109603
Closed Access | Times Cited: 5
Preparation of SiO2@MnO2 composite abrasives and their performance in chemical-mechanical polishing of SiC substrates
Ruixing Yang, Hong Lei, Jianhua Zhang
Ceramics International (2024) Vol. 50, Iss. 19, pp. 34796-34805
Closed Access | Times Cited: 5
Coupling Effect of Polishing Solution and Frictional Heat on the Surface Quality Properties of Titanium Alloy Materials
Yunlong Yao, Xiaokun Wei, Zhankui Wang, et al.
Materials Today Communications (2025), pp. 112185-112185
Closed Access
Close atomic surface of stainless steel produced by developed novel green chemical mechanical polishing using silica and samaria composite abrasives
Zhuangzhuang Song, Dong Wang, Zhenyu Zhang, et al.
Surfaces and Interfaces (2025), pp. 106474-106474
Closed Access
Achieving atomic surface of Ti-6Al-4V alloys in chemical mechanical planarization using phytic acid as corrosion inhibitor, chelator and pH adjuster
Yuhan Chen, Chun Cao, Jianting Liu, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2025) Vol. 718, pp. 136914-136914
Closed Access
Unprecedented developed composite polishing system to achieve atomic surface integrating rough and fine polishing using a novel hyper-conjugated pad through controlling the temperature of a proposed green slurry
Feng Zhao, Zhenyu Zhang, Hongxiu Zhou, et al.
Advanced Composites and Hybrid Materials (2025) Vol. 8, Iss. 3
Open Access
Quantitative analysis of the polishing performance of Wurtzite-SiC surface texture on surface quality and material removal rate
Tan-Tai Do, Phu-Cuong Le, Te‐Hua Fang
Tribology International (2024) Vol. 199, pp. 110020-110020
Closed Access | Times Cited: 3
Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism
X. Zhu, Juxuan Ding, Zhangchao Mo, et al.
Applied Surface Science (2024) Vol. 679, pp. 161157-161157
Closed Access | Times Cited: 3
Review on chemical mechanical polishing for atomic surfaces using advanced rare earth abrasives
X. Chen, Zhenyu Zhang, Feng Zhao, et al.
Journal of Physics D Applied Physics (2024) Vol. 58, Iss. 2, pp. 023004-023004
Closed Access | Times Cited: 3
Lapping of sapphire using developed clusters of diamond and ceria chemically active abrasives
Zhankui Wang, Shangci Huang, Kuncheng Liu, et al.
Materials Today Communications (2024) Vol. 39, pp. 109386-109386
Closed Access | Times Cited: 2
The influence of the types of cluster composite abrasives on the performance of fixed abrasive pads in processing quartz glass
Zhankui Wang, Pengzhan Wang, Xiaokun Wei, et al.
Materials Today Communications (2024) Vol. 39, pp. 108998-108998
Closed Access | Times Cited: 2
Chemical mechanical polishing of sapphire elucidated by densely discrete phase model and verified using atomic force microscopy
Mufang Zhou, Min Zhong, Wenhu Xu, et al.
Tribology International (2024) Vol. 197, pp. 109834-109834
Closed Access | Times Cited: 2
New skin corrosion effect of magnetorheological electro-Fenton polishing investigated by friction and wear experiments
Yangting Ou, Hao Wang, Yusen Wu, et al.
Materials Science in Semiconductor Processing (2024) Vol. 184, pp. 108759-108759
Closed Access | Times Cited: 2
A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces
Fukun Li, Bai Yang, Haixiang Hu, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2024), pp. 135892-135892
Closed Access | Times Cited: 2
Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution
Haoyu Du, Renhao Liu, Baimei Tan, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2024) Vol. 697, pp. 134428-134428
Closed Access | Times Cited: 1
Chemical-mechanical synergetic effect of single crystal SiC polishing using Fe3O4@MIL-100(Fe) magnetic photo-Fenton catalyst
Bo Ran, Jisheng Pan, Qiusheng Yan, et al.
Diamond and Related Materials (2024) Vol. 149, pp. 111545-111545
Closed Access | Times Cited: 1
Study of the impact of flake Al2O3 abrasive and N-n-Butylimidazole in backside CMP (Chemical Mechanical Polishing) of TSV (Through Silicon Via) wafers
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access | Times Cited: 1
Study on the polishing performance and mechanism of sapphire wafers by different types of degradable surfactants
Yongchao Xu, Cheng Peng, Ningchang Wang, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104915-104915
Closed Access
Towards atomic-scale smooth surface manufacturing of β-Ga2O3 via highly efficient atmospheric plasma etching
Yongjie Zhang, Yuxi Xiao, Jianwen Liang, et al.
International Journal of Extreme Manufacturing (2024) Vol. 7, Iss. 1, pp. 015105-015105
Open Access
Zirconium and/or cerium-containing mesoporous silica as functional active abrasive particles for radical-facilitated chemical mechanical polishing
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
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