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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Bimolecular Reaction Mechanism in the Amido Complex-Based Atomic Layer Deposition of HfO2
Giulio D’Acunto, Roman Tsyshevsky, Payam Shayesteh, et al.
Chemistry of Materials (2023) Vol. 35, Iss. 2, pp. 529-538
Open Access | Times Cited: 11

Showing 11 citing articles:

Adsorption of dimethylaluminum isopropoxide (DMAI) on the Al2O3 surface: A machine-learning potential study
Miso Kim, Se-Hee Kim, Bonggeun Shong
Journal of Science Advanced Materials and Devices (2024) Vol. 9, Iss. 3, pp. 100754-100754
Open Access | Times Cited: 7
Operando study of HfO2 atomic layer deposition on partially hydroxylated Si(111)
Rosemary Jones, Giulio D’Acunto, Payam Shayesteh, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 2
Open Access | Times Cited: 6
Resolving the Heat Generated from ZrO2 Atomic Layer Deposition Surface Reactions
Ashley R. Bielinski, Ethan P. Kamphaus, Lei Cheng, et al.
Angewandte Chemie International Edition (2023) Vol. 62, Iss. 30
Open Access | Times Cited: 8
Time evolution of surface species during the ALD of high-k oxide on InAs
Giulio D’Acunto, Payam Shayesteh, Esko Kokkonen, et al.
Surfaces and Interfaces (2023) Vol. 39, pp. 102927-102927
Open Access | Times Cited: 6
Chemisorption of Tetrakis(dimethylamino)zirconium on Zirconium Oxide: Density Functional Theory Study
Romel Hidayat, Hye-Lee Kim, Yong Richard Sriwijaya, et al.
Surfaces and Interfaces (2024) Vol. 50, pp. 104480-104480
Closed Access | Times Cited: 1
Support Vector Regression Model for Determining Optimal Parameters of HfAlO-Based Charge Trapping Memory Devices
Yifan Hu, Fucheng Wang, Jingwen Chen, et al.
Electronics (2023) Vol. 12, Iss. 14, pp. 3139-3139
Open Access | Times Cited: 3
Growth mechanism of HfO2 film on H-terminated Si (100) surface from atomic layer deposition process using tetrakis(ethylmethylamino)hafnium
Truong Ba Tai, Phuong Minh Nguyen, Jonghun Lim, et al.
Surfaces and Interfaces (2024) Vol. 53, pp. 105024-105024
Closed Access
Ambient pressure x-ray photoelectron spectroscopy study on the initial atomic layer deposition process of platinum
Esko Kokkonen, Heta-Elisa Nieminen, Foqia Rehman, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 6
Open Access
Time-resolved ambient pressure x-ray photoelectron spectroscopy: advancing the operando study of ALD chemistry
Rosemary Jones, Esko Kokkonen, Calley Eads, et al.
Surface Science (2024), pp. 122656-122656
Open Access
In Situ Studies of Atomic Layer Deposition of Hafnium Oxide on (Ag,Cu)(In,Ga)Se2 for Thin Film Solar Cells
Natalia M. Martin, Melike Babucci, Lars Stolt, et al.
ACS Applied Energy Materials (2024) Vol. 8, Iss. 1, pp. 461-472
Open Access
Resolving the Heat Generated from ZrO2 Atomic Layer Deposition Surface Reactions
Ashley R. Bielinski, Ethan P. Kamphaus, Lei Cheng, et al.
Angewandte Chemie (2023) Vol. 135, Iss. 30
Open Access
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