OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Atomic level surface on aspheric quartz crucible with large sizes induced by developed green chemical mechanical polishing with composite rare earth oxides
Huiguang Sun, Zhenyu Zhang, Zinuo Zeng, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104924-104924
Closed Access | Times Cited: 6
Huiguang Sun, Zhenyu Zhang, Zinuo Zeng, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104924-104924
Closed Access | Times Cited: 6
Showing 6 citing articles:
Chemical mechanical polishing on cobalt-based barrier through dual functionality of salicylhydroxamic acid between the removal of copper and corrosion inhibition
Yingqi Di, Guofeng Pan, Song Lv, et al.
Electrochimica Acta (2025) Vol. 514, pp. 145689-145689
Closed Access
Yingqi Di, Guofeng Pan, Song Lv, et al.
Electrochimica Acta (2025) Vol. 514, pp. 145689-145689
Closed Access
Redefining surface dynamics: Advanced insights into nanoindentation and morphological variability of foamed polyurethane
Yongshen Wu, Cuixia Wang, Caihong Zhang, et al.
Surfaces and Interfaces (2025), pp. 106000-106000
Closed Access
Yongshen Wu, Cuixia Wang, Caihong Zhang, et al.
Surfaces and Interfaces (2025), pp. 106000-106000
Closed Access
Counterion-Driven Mechanochemical Reactions at TC4 Alloy/SiO2 Interfaces: Electrical Double Layer and Dynamic Ionic Radius
Jinwei Liu, Xin Zeng, Peng Zhang, et al.
Tribology Letters (2024) Vol. 73, Iss. 1
Closed Access
Jinwei Liu, Xin Zeng, Peng Zhang, et al.
Tribology Letters (2024) Vol. 73, Iss. 1
Closed Access
A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces
Fukun Li, Bai Yang, Haixiang Hu, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2024), pp. 135892-135892
Closed Access
Fukun Li, Bai Yang, Haixiang Hu, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2024), pp. 135892-135892
Closed Access
Study of the impact of flake Al2O3 abrasive and N-n-Butylimidazole in backside CMP (Chemical Mechanical Polishing) of TSV (Through Silicon Via) wafers
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access
Efficient large-area polishing of fused silica surfaces based on inductively coupled plasma
Hao Sun, Yixiao Ruan, Qixian Cao, et al.
Applied Surface Science (2024), pp. 161308-161308
Closed Access
Hao Sun, Yixiao Ruan, Qixian Cao, et al.
Applied Surface Science (2024), pp. 161308-161308
Closed Access
Double-Oxidant-Induced Slurry Reaction Mechanism and Performance on Chemical Mechanical Polishing of 4H-SiC (0001) Wafer
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
