OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Advanced polishing methods for atomic-scale surfaces: A review
Zhun Luo, Zhenyu Zhang, Feng Zhao, et al.
Materials Today Sustainability (2024) Vol. 27, pp. 100841-100841
Closed Access | Times Cited: 14
Zhun Luo, Zhenyu Zhang, Feng Zhao, et al.
Materials Today Sustainability (2024) Vol. 27, pp. 100841-100841
Closed Access | Times Cited: 14
Showing 14 citing articles:
Characterizing the contact evolution through the combination of surface roughness parameters in chemical mechanical polishing using a polyurethane polishing pad
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access
Research on Deflection and Stress Analyses and the Improvement of the Removal Uniformity of Silicon in a Single-Sided Polishing Machine Under Pressure
Guoqing Ye, Zhenqiang Yao
Micromachines (2025) Vol. 16, Iss. 2, pp. 198-198
Open Access
Guoqing Ye, Zhenqiang Yao
Micromachines (2025) Vol. 16, Iss. 2, pp. 198-198
Open Access
Close atomic surface on aluminum alloy using green chemical mechanical polishing with synergistic effect between yttria and silica abrasives
Zeyun Wang, Zhenyu Zhang, Hongxiu Zhou, et al.
Applied Surface Science (2024), pp. 161586-161586
Closed Access | Times Cited: 3
Zeyun Wang, Zhenyu Zhang, Hongxiu Zhou, et al.
Applied Surface Science (2024), pp. 161586-161586
Closed Access | Times Cited: 3
New skin corrosion effect of magnetorheological electro-Fenton polishing investigated by friction and wear experiments
Yangting Ou, Hao Wang, Yusen Wu, et al.
Materials Science in Semiconductor Processing (2024) Vol. 184, pp. 108759-108759
Closed Access | Times Cited: 1
Yangting Ou, Hao Wang, Yusen Wu, et al.
Materials Science in Semiconductor Processing (2024) Vol. 184, pp. 108759-108759
Closed Access | Times Cited: 1
Chemical-mechanical synergetic effect of single crystal SiC polishing using Fe3O4@MIL-100(Fe) magnetic photo-Fenton catalyst
Bo Ran, Jisheng Pan, Qiusheng Yan, et al.
Diamond and Related Materials (2024) Vol. 149, pp. 111545-111545
Closed Access | Times Cited: 1
Bo Ran, Jisheng Pan, Qiusheng Yan, et al.
Diamond and Related Materials (2024) Vol. 149, pp. 111545-111545
Closed Access | Times Cited: 1
Nanocasting synthesis of mesoporous CeO2 particle abrasives from mesoporous SiO2 hard templates for enhanced chemical mechanical polishing performance
Yang Chen, Yifan Xia, Chao Wang, et al.
Ceramics International (2024)
Closed Access | Times Cited: 1
Yang Chen, Yifan Xia, Chao Wang, et al.
Ceramics International (2024)
Closed Access | Times Cited: 1
Exploring the effectiveness of polyhydroxy complexing agents in sapphire chemical mechanical polishing: combining experiments and theoretical calculation
Xinjie Li, Yida Zou, Xinhuan Niu, et al.
Tribology International (2024) Vol. 199, pp. 110042-110042
Closed Access
Xinjie Li, Yida Zou, Xinhuan Niu, et al.
Tribology International (2024) Vol. 199, pp. 110042-110042
Closed Access
Study on the polishing performance and mechanism of sapphire wafers by different types of degradable surfactants
Yongchao Xu, Cheng Peng, Ningchang Wang, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104915-104915
Closed Access
Yongchao Xu, Cheng Peng, Ningchang Wang, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104915-104915
Closed Access
Experimental Study of Key Factors on Super Smooth Surface Fabrication Upon Single Crystal Silicon Based on Mechanochemical Synergy
Xiao Shen, Xiaoyu Weng, Yancheng Li, et al.
Tribology International (2024) Vol. 201, pp. 110199-110199
Closed Access
Xiao Shen, Xiaoyu Weng, Yancheng Li, et al.
Tribology International (2024) Vol. 201, pp. 110199-110199
Closed Access
Molecular dynamics simulations in semiconductor material processing: A comprehensive review
Yixin Yun, Shujing Wu, Dazhong Wang, et al.
Measurement (2024), pp. 115708-115708
Closed Access
Yixin Yun, Shujing Wu, Dazhong Wang, et al.
Measurement (2024), pp. 115708-115708
Closed Access
Double-Oxidant-Induced Slurry Reaction Mechanism and Performance on Chemical Mechanical Polishing of 4H-SiC (0001) Wafer
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
Synthesis, characterization and CMP property of neat and doped mesoporous ceria as defective active particle abrasives
Yang Chen, Pingyang Li, Chao Wang, et al.
Surfaces and Interfaces (2024) Vol. 56, pp. 105614-105614
Closed Access
Yang Chen, Pingyang Li, Chao Wang, et al.
Surfaces and Interfaces (2024) Vol. 56, pp. 105614-105614
Closed Access
Study of the impact of flake Al2O3 abrasive and N-n-Butylimidazole in backside CMP (Chemical Mechanical Polishing) of TSV (Through Silicon Via) wafers
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access
Effects of organic compounds rich in phosphate functional groups as multifunctional inhibitors on copper film chemical-mechanical polishing properties: Combined experiment and theoretical calculation
Changxin Dong, Xinhuan Niu, Chao He, et al.
Tribology International (2024), pp. 110276-110276
Closed Access
Changxin Dong, Xinhuan Niu, Chao He, et al.
Tribology International (2024), pp. 110276-110276
Closed Access
Zirconium and/or cerium-containing mesoporous silica as functional active abrasive particles for radical-facilitated chemical mechanical polishing
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
