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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Atomic-scale planarization surface of quartz glass induced by novel green chemical mechanical polishing using three ingredients
Dong Wang, Lu Liu, Zhenyu Zhang, et al.
Materials Today Sustainability (2024) Vol. 25, pp. 100669-100669
Closed Access | Times Cited: 31

Showing 1-25 of 31 citing articles:

Advanced polishing methods for atomic-scale surfaces: A review
Zhun Luo, Zhenyu Zhang, Feng Zhao, et al.
Materials Today Sustainability (2024) Vol. 27, pp. 100841-100841
Closed Access | Times Cited: 18
A review on the development of ceria for chemical mechanical polishing
Jiahui Ma, Ning Xu, Jie Cheng, et al.
Powder Technology (2024) Vol. 444, pp. 119989-119989
Closed Access | Times Cited: 14
Novel ceria/graphene oxide composite abrasives for chemical mechanical polishing
Chuandong Chen, Yanying Cui, Xiaopei Li, et al.
Ceramics International (2024) Vol. 50, Iss. 15, pp. 26325-26333
Closed Access | Times Cited: 10
Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives
Xiaoxiao Zhu, Yuziyu Gui, Hao Fu, et al.
Tribology International (2024) Vol. 197, pp. 109827-109827
Closed Access | Times Cited: 9
Preparation of SiO2@MnO2 composite abrasives and their performance in chemical-mechanical polishing of SiC substrates
Ruixing Yang, Hong Lei, Jianhua Zhang
Ceramics International (2024) Vol. 50, Iss. 19, pp. 34796-34805
Closed Access | Times Cited: 5
Chemical mechanical polishing on cobalt-based barrier through dual functionality of salicylhydroxamic acid between the removal of copper and corrosion inhibition
Yingqi Di, Guofeng Pan, Song Lv, et al.
Electrochimica Acta (2025) Vol. 514, pp. 145689-145689
Closed Access
Characterizing the contact evolution through the combination of surface roughness parameters in chemical mechanical polishing using a polyurethane polishing pad
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access
Recycling and Reuse of Rare Earth Polishing Powder Waste by a Simple Gravity Settling-Acid Leaching Process
X. Zhu, Xuesong Jiang, Juxuan Ding, et al.
Waste and Biomass Valorization (2025)
Closed Access
Atomic surface of fused silica with high material removal rate produced by novel chemical mechanical polishing using composite rare earth oxides
Xiaohong Chen, Zhenyu Zhang, Leilei Chen, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2025), pp. 136420-136420
Closed Access
Dual impact of Nd3+ doping on CeO2 abrasives: enhancing chemical and mechanical effects in chemical–mechanical polishing
Yesheng Zhang, Lei Hong, Jianhua Zhang, et al.
Surface Science and Technology (2025) Vol. 3, Iss. 1
Open Access
Coupling Effect of Polishing Solution and Frictional Heat on the Surface Quality Properties of Titanium Alloy Materials
Yunlong Yao, Xiaokun Wei, Zhankui Wang, et al.
Materials Today Communications (2025), pp. 112185-112185
Closed Access
Study on orthogonal optimization of process parameters for SiCp/Al composite materials by WEDM
Zhou Sun, Linglei Kong, Weining Lei, et al.
Materials and Manufacturing Processes (2025), pp. 1-12
Closed Access
Development and characterization of a novel alginate-based slurry and its fused silica CMP investigations
Gong Lv, Yuxi Cao, Shengsheng Liu, et al.
Ceramics International (2025)
Closed Access
Effect of a novel alginate/5-aminovaleric acid slurry with CeO2/MoS2 abrasives on surface roughness and material removal rate of quartz glass
Gong Lv, Enqiang Hao, Zefang Zhang, et al.
Applied Surface Science (2025), pp. 163096-163096
Closed Access
Crystal structure transformation and lattice impurities migration of quartz during chlorine roasting
W. Guo, Lu Hong, Zhenyue Zhang, et al.
International Journal of Mining Science and Technology (2024)
Open Access | Times Cited: 4
Effect of synergistic CeO2/MoS2 abrasives on surface roughness and material removal rate of quartz glass
Gong Lv, Shengsheng Liu, Yuxi Cao, et al.
Ceramics International (2024)
Closed Access | Times Cited: 3
The influence of the types of cluster composite abrasives on the performance of fixed abrasive pads in processing quartz glass
Zhankui Wang, Pengzhan Wang, Xiaokun Wei, et al.
Materials Today Communications (2024) Vol. 39, pp. 108998-108998
Closed Access | Times Cited: 2
Lapping of sapphire using developed clusters of diamond and ceria chemically active abrasives
Zhankui Wang, Shangci Huang, Kuncheng Liu, et al.
Materials Today Communications (2024) Vol. 39, pp. 109386-109386
Closed Access | Times Cited: 2
Chemical mechanical polishing of sapphire elucidated by densely discrete phase model and verified using atomic force microscopy
Mufang Zhou, Min Zhong, Wenhu Xu, et al.
Tribology International (2024) Vol. 197, pp. 109834-109834
Closed Access | Times Cited: 2
Quantitative analysis of the polishing performance of Wurtzite-SiC surface texture on surface quality and material removal rate
Tan-Tai Do, Phu-Cuong Le, Te‐Hua Fang
Tribology International (2024) Vol. 199, pp. 110020-110020
Closed Access | Times Cited: 2
Exploring the effectiveness of polyhydroxy complexing agents in sapphire chemical mechanical polishing: combining experiments and theoretical calculation
Xinjie Li, Yida Zou, Xinhuan Niu, et al.
Tribology International (2024) Vol. 199, pp. 110042-110042
Closed Access | Times Cited: 2
Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism
X. Zhu, Juxuan Ding, Zhangchao Mo, et al.
Applied Surface Science (2024) Vol. 679, pp. 161157-161157
Closed Access | Times Cited: 2
Atomic surface on fused silica induced by novel green photochemical mechanical polishing
Chunjing Shi, Zhenyu Zhang, Leilei Chen, et al.
Surfaces and Interfaces (2024) Vol. 54, pp. 105253-105253
Closed Access | Times Cited: 2
Experimental study of ECDM using a porous electrode containing internal micropores
Linglei Kong, Lei Zhang, Weining Lei, et al.
Materials and Manufacturing Processes (2024) Vol. 39, Iss. 14, pp. 2020-2032
Closed Access | Times Cited: 1
Cleaning mechanisms during post chemical mechanical polishing (CMP) using particle removal of surfactants via a citric acid-based solution
Haoyu Du, Renhao Liu, Baimei Tan, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2024) Vol. 697, pp. 134428-134428
Closed Access | Times Cited: 1
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