OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Development of Highly stable ceria slurry in acetic acid-ammonium acetate buffer Media for effective chemical mechanical polishing of silicon dioxide
Min Liu, Baoguo Zhang, Jihoon Seo, et al.
Materials Science in Semiconductor Processing (2024) Vol. 177, pp. 108411-108411
Closed Access | Times Cited: 6
Min Liu, Baoguo Zhang, Jihoon Seo, et al.
Materials Science in Semiconductor Processing (2024) Vol. 177, pp. 108411-108411
Closed Access | Times Cited: 6
Showing 6 citing articles:
Effect of surfactants with different ionizing properties on dispersion stability and PCMP properties of CeO2 nanoparticle polishing slurry
Ning Xu, Yu Lin, Yuxin Luo, et al.
Ceramics International (2024)
Closed Access | Times Cited: 4
Ning Xu, Yu Lin, Yuxin Luo, et al.
Ceramics International (2024)
Closed Access | Times Cited: 4
Enhancing dispersion stability and recyclability of ceria slurry with polyacrylic acid for improved glass polishing performance
Arunkumar Venkataronappa, Jonas Bankaitis, Jihoon Seo
Journal of Industrial and Engineering Chemistry (2024) Vol. 138, pp. 623-631
Closed Access | Times Cited: 2
Arunkumar Venkataronappa, Jonas Bankaitis, Jihoon Seo
Journal of Industrial and Engineering Chemistry (2024) Vol. 138, pp. 623-631
Closed Access | Times Cited: 2
Simple Smoothing of the Bottom Silicon Surface Using Wet Chemical Etching Methods for Epitaxial III‐V/Silicon Tandem Manufacturing
Mengmeng Chu, Junhan Bae, Muhammad Quddamah Khokhar, et al.
Energy Technology (2024)
Open Access
Mengmeng Chu, Junhan Bae, Muhammad Quddamah Khokhar, et al.
Energy Technology (2024)
Open Access
Optimization of polishing fluid composition for single crystal silicon carbide by ultrasonic assisted chemical-mechanical polishing
Linzheng Ye, Jialong Wu, Xijing Zhu, et al.
Scientific Reports (2024) Vol. 14, Iss. 1
Closed Access
Linzheng Ye, Jialong Wu, Xijing Zhu, et al.
Scientific Reports (2024) Vol. 14, Iss. 1
Closed Access
The mechanism of ceria slurry on chemical mechanical polishing efficiency and surface quality of Gallium nitride
Wenhao Xian, Baoguo Zhang, Shitong Liu, et al.
Materials Science in Semiconductor Processing (2024) Vol. 188, pp. 109208-109208
Closed Access
Wenhao Xian, Baoguo Zhang, Shitong Liu, et al.
Materials Science in Semiconductor Processing (2024) Vol. 188, pp. 109208-109208
Closed Access
The Stability Evaluation of Ceria Slurry Using Polymer Dispersants with Varying Contents for Chemical Mechanical Polishing Process
Sohee Hwang, Jihee Park, Woonjung Kim
Polymers (2024) Vol. 16, Iss. 24, pp. 3593-3593
Open Access
Sohee Hwang, Jihee Park, Woonjung Kim
Polymers (2024) Vol. 16, Iss. 24, pp. 3593-3593
Open Access
