
OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Novel full-scale model verified by atomic surface and developed composite microfiber and slurry polishing system
Feng Zhao, Zhenyu Zhang, Hongxiu Zhou, et al.
Composites Part B Engineering (2024) Vol. 283, pp. 111598-111598
Closed Access | Times Cited: 17
Feng Zhao, Zhenyu Zhang, Hongxiu Zhou, et al.
Composites Part B Engineering (2024) Vol. 283, pp. 111598-111598
Closed Access | Times Cited: 17
Showing 17 citing articles:
Chemical mechanical polishing on cobalt-based barrier through dual functionality of salicylhydroxamic acid between the removal of copper and corrosion inhibition
Yingqi Di, Guofeng Pan, Song Lv, et al.
Electrochimica Acta (2025) Vol. 514, pp. 145689-145689
Closed Access
Yingqi Di, Guofeng Pan, Song Lv, et al.
Electrochimica Acta (2025) Vol. 514, pp. 145689-145689
Closed Access
Study on the effect of process parameters and removal behavior of single-crystal SiC polishing based on a photocatalytic fixed polishing plate
Lin Chen, Xie Jilong, Jiabin Lu, et al.
Diamond and Related Materials (2025) Vol. 153, pp. 111985-111985
Closed Access
Lin Chen, Xie Jilong, Jiabin Lu, et al.
Diamond and Related Materials (2025) Vol. 153, pp. 111985-111985
Closed Access
Characterizing the contact evolution through the combination of surface roughness parameters in chemical mechanical polishing using a polyurethane polishing pad
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access
Back Propagation Neural Network-Based Predictive Model for Magnetorheological–Chemical Polishing of Silicon Carbide
Huazhuo Liang, Wenjie Chen, Youzhi Fu, et al.
Micromachines (2025) Vol. 16, Iss. 3, pp. 271-271
Open Access
Huazhuo Liang, Wenjie Chen, Youzhi Fu, et al.
Micromachines (2025) Vol. 16, Iss. 3, pp. 271-271
Open Access
Coupling Effect of Polishing Solution and Frictional Heat on the Surface Quality Properties of Titanium Alloy Materials
Yunlong Yao, Xiaokun Wei, Zhankui Wang, et al.
Materials Today Communications (2025), pp. 112185-112185
Closed Access
Yunlong Yao, Xiaokun Wei, Zhankui Wang, et al.
Materials Today Communications (2025), pp. 112185-112185
Closed Access
Enhanced properties of dual-scale bionic superhydrophobic surface on Ti-6Al-4V fabricated via laser powder bed fusion
Xuezhang Hou, Zhenyu Zhang, Dong Wang, et al.
Surface and Coatings Technology (2025), pp. 132044-132044
Closed Access
Xuezhang Hou, Zhenyu Zhang, Dong Wang, et al.
Surface and Coatings Technology (2025), pp. 132044-132044
Closed Access
Sulfonated poly (ether ether ketone) asymmetrical pore-filling PTFE composite membrane with highly selective for vanadium flow batteries
Pengjin Zeng, Su Yi, Biao Huang, et al.
International Journal of Hydrogen Energy (2025) Vol. 120, pp. 365-373
Closed Access
Pengjin Zeng, Su Yi, Biao Huang, et al.
International Journal of Hydrogen Energy (2025) Vol. 120, pp. 365-373
Closed Access
Synergistic effect of physics and chemistry on material removal of fused quartz in nanoparticle jet polishing
Jiahui Li, Weihao Ma, Xi Hou
Ceramics International (2024) Vol. 50, Iss. 22, pp. 46600-46610
Closed Access | Times Cited: 2
Jiahui Li, Weihao Ma, Xi Hou
Ceramics International (2024) Vol. 50, Iss. 22, pp. 46600-46610
Closed Access | Times Cited: 2
Exploring the effectiveness of polyhydroxy complexing agents in sapphire chemical mechanical polishing: combining experiments and theoretical calculation
Xinjie Li, Yida Zou, Xinhuan Niu, et al.
Tribology International (2024) Vol. 199, pp. 110042-110042
Closed Access | Times Cited: 1
Xinjie Li, Yida Zou, Xinhuan Niu, et al.
Tribology International (2024) Vol. 199, pp. 110042-110042
Closed Access | Times Cited: 1
Chemical-mechanical synergetic effect of single crystal SiC polishing using Fe3O4@MIL-100(Fe) magnetic photo-Fenton catalyst
Bo Ran, Jisheng Pan, Qiusheng Yan, et al.
Diamond and Related Materials (2024) Vol. 149, pp. 111545-111545
Closed Access | Times Cited: 1
Bo Ran, Jisheng Pan, Qiusheng Yan, et al.
Diamond and Related Materials (2024) Vol. 149, pp. 111545-111545
Closed Access | Times Cited: 1
Counterion-Driven Mechanochemical Reactions at TC4 Alloy/SiO2 Interfaces: Electrical Double Layer and Dynamic Ionic Radius
Jinwei Liu, Xin Zeng, Peng Zhang, et al.
Tribology Letters (2024) Vol. 73, Iss. 1
Closed Access | Times Cited: 1
Jinwei Liu, Xin Zeng, Peng Zhang, et al.
Tribology Letters (2024) Vol. 73, Iss. 1
Closed Access | Times Cited: 1
A novel green CeO2 polishing slurry and its chemical mechanical action mechanism for achieving atomic-level smoothing of fused silica glass surfaces
Fukun Li, Bai Yang, Haixiang Hu, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2024), pp. 135892-135892
Closed Access | Times Cited: 1
Fukun Li, Bai Yang, Haixiang Hu, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2024), pp. 135892-135892
Closed Access | Times Cited: 1
Study on the polishing performance and mechanism of sapphire wafers by different types of degradable surfactants
Yongchao Xu, Cheng Peng, Ningchang Wang, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104915-104915
Closed Access
Yongchao Xu, Cheng Peng, Ningchang Wang, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104915-104915
Closed Access
Experimental Study of Key Factors on Super Smooth Surface Fabrication Upon Single Crystal Silicon Based on Mechanochemical Synergy
Xiao Shen, Xiaoyu Weng, Yancheng Li, et al.
Tribology International (2024) Vol. 201, pp. 110199-110199
Closed Access
Xiao Shen, Xiaoyu Weng, Yancheng Li, et al.
Tribology International (2024) Vol. 201, pp. 110199-110199
Closed Access
Double-Oxidant-Induced Slurry Reaction Mechanism and Performance on Chemical Mechanical Polishing of 4H-SiC (0001) Wafer
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
Zirconium and/or cerium-containing mesoporous silica as functional active abrasive particles for radical-facilitated chemical mechanical polishing
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
Study of the impact of flake Al2O3 abrasive and N-n-Butylimidazole in backside CMP (Chemical Mechanical Polishing) of TSV (Through Silicon Via) wafers
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access