OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Environmentally friendly buff cleaning of ceria nanoparticles using bubbles in gas-dissolved water
Pengzhan Liu, Yuna Nam, Sanghuck Jeon, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2023) Vol. 671, pp. 131558-131558
Closed Access | Times Cited: 8
Pengzhan Liu, Yuna Nam, Sanghuck Jeon, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2023) Vol. 671, pp. 131558-131558
Closed Access | Times Cited: 8
Showing 8 citing articles:
A review on the development of ceria for chemical mechanical polishing
Jiahui Ma, Ning Xu, Jie Cheng, et al.
Powder Technology (2024) Vol. 444, pp. 119989-119989
Closed Access | Times Cited: 14
Jiahui Ma, Ning Xu, Jie Cheng, et al.
Powder Technology (2024) Vol. 444, pp. 119989-119989
Closed Access | Times Cited: 14
Research progress on the application of ceria nanoparticles as abrasives in dielectric layer CMP and post cleaning: Structure, morphology, doping, and mechanism
Xinyu Han, Renhao Liu, Baimei Tan, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2023) Vol. 679, pp. 132551-132551
Closed Access | Times Cited: 13
Xinyu Han, Renhao Liu, Baimei Tan, et al.
Colloids and Surfaces A Physicochemical and Engineering Aspects (2023) Vol. 679, pp. 132551-132551
Closed Access | Times Cited: 13
A study on eco-friendly organic antimicrobial agents to inhibit microbial growth in copper chemical mechanical polishing slurry
Jae‐Won Lee, Gyuyoung Lee, Seunghwan Lee, et al.
Journal of Manufacturing Processes (2025) Vol. 137, pp. 363-375
Closed Access
Jae‐Won Lee, Gyuyoung Lee, Seunghwan Lee, et al.
Journal of Manufacturing Processes (2025) Vol. 137, pp. 363-375
Closed Access
Micro-Nano Bubbles: A New Field of Eco-Friendly Cleaning
Nan Guan, Yao Wang, Jun Hu, et al.
Nanomaterials (2025) Vol. 15, Iss. 7, pp. 480-480
Open Access
Nan Guan, Yao Wang, Jun Hu, et al.
Nanomaterials (2025) Vol. 15, Iss. 7, pp. 480-480
Open Access
Particle removal behavior of micropatterned pad buffing in post-CMP cleaning
Hokyoung Jung, Youngwook Park, Hanchul Cho, et al.
Materials Science in Semiconductor Processing (2025) Vol. 194, pp. 109530-109530
Open Access
Hokyoung Jung, Youngwook Park, Hanchul Cho, et al.
Materials Science in Semiconductor Processing (2025) Vol. 194, pp. 109530-109530
Open Access
Systematic root cause analysis of ceria-induced defects during chemical mechanical planarization and cleaning
Van-Tuan Nguyen, James R. Wait, Tomoya Nishi, et al.
Journal of Manufacturing Processes (2024) Vol. 127, pp. 27-34
Closed Access | Times Cited: 2
Van-Tuan Nguyen, James R. Wait, Tomoya Nishi, et al.
Journal of Manufacturing Processes (2024) Vol. 127, pp. 27-34
Closed Access | Times Cited: 2
Dynamic visualization study of in situ cleaning of polystyrene microparticles off silicon wafer surface
Qian Wu, Hui Zhao, Haifeng Liu
Physics of Fluids (2024) Vol. 36, Iss. 11
Closed Access | Times Cited: 1
Qian Wu, Hui Zhao, Haifeng Liu
Physics of Fluids (2024) Vol. 36, Iss. 11
Closed Access | Times Cited: 1
Effects of Gas-Dissolved Water for Ceria Nanoparticles on the SiO2 Film Surface in Post-CMP Cleaning
Ki‐Hong Park, Wookyung Jeon, Pengzhan Liu, et al.
ECS Journal of Solid State Science and Technology (2024) Vol. 13, Iss. 5, pp. 054006-054006
Closed Access
Ki‐Hong Park, Wookyung Jeon, Pengzhan Liu, et al.
ECS Journal of Solid State Science and Technology (2024) Vol. 13, Iss. 5, pp. 054006-054006
Closed Access
