OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Enhanced dielectric and energy storage performances of Hf0.6Zr0.4O2 thin films by Al doping
Seungwon Lee, Min Ji Jeong, Youkyoung Oh, et al.
Ceramics International (2023) Vol. 49, Iss. 11, pp. 18055-18060
Closed Access | Times Cited: 8
Seungwon Lee, Min Ji Jeong, Youkyoung Oh, et al.
Ceramics International (2023) Vol. 49, Iss. 11, pp. 18055-18060
Closed Access | Times Cited: 8
Showing 8 citing articles:
Recent development of lead-free relaxor ferroelectric and antiferroelectric thin films as energy storage dielectric capacitors
K.C. Sekhar, B. Anina Anju, Surya Kiran P. Nair, et al.
Journal of the European Ceramic Society (2024) Vol. 44, Iss. 7, pp. 4332-4349
Open Access | Times Cited: 17
K.C. Sekhar, B. Anina Anju, Surya Kiran P. Nair, et al.
Journal of the European Ceramic Society (2024) Vol. 44, Iss. 7, pp. 4332-4349
Open Access | Times Cited: 17
Simultaneously achieving high-κ and strong ferroelectricity in Hf0.5Zr0.5O2 thin film by structural stacking design
Yuchen Wang, Jiachen Li, Hong Zhu, et al.
Journal of Materiomics (2025), pp. 101016-101016
Open Access
Yuchen Wang, Jiachen Li, Hong Zhu, et al.
Journal of Materiomics (2025), pp. 101016-101016
Open Access
5.1 Å EOT and low leakage TiN/Al2O3/Hf0.5Zr0.5O2/Al2O3/TiN heterostructure for DRAM capacitor
Zhen Luo, Xinzhe Du, Hui Gan, et al.
Applied Physics Letters (2023) Vol. 122, Iss. 19
Closed Access | Times Cited: 8
Zhen Luo, Xinzhe Du, Hui Gan, et al.
Applied Physics Letters (2023) Vol. 122, Iss. 19
Closed Access | Times Cited: 8
Introducing a controlled interfacial layer to enhance the template effect of ZrO2 in the ZrO2/HfO2/ZrO2 structure
Woo Young Park, In Gyu Lee, Young Uk Ryu, et al.
IEEE Electron Device Letters (2024) Vol. 45, Iss. 10, pp. 1808-1810
Closed Access
Woo Young Park, In Gyu Lee, Young Uk Ryu, et al.
IEEE Electron Device Letters (2024) Vol. 45, Iss. 10, pp. 1808-1810
Closed Access
Robust energy storage density and negative capacitance in antiferroelectric heterostructures grown by atomic layer epitaxy
Yu‐Sen Jiang, Yi-Hsuan Chao, Makoto Shiojiri, et al.
Journal of Materials Chemistry A (2024)
Closed Access
Yu‐Sen Jiang, Yi-Hsuan Chao, Makoto Shiojiri, et al.
Journal of Materials Chemistry A (2024)
Closed Access
Fabrication and Characterization of HfxAl(1-x)Oy Ceramic Targets and Thin Films by RF Sputtering
In Pyo Hong, Rui He, Chung Wung Bark
Ceramics International (2024) Vol. 50, Iss. 17, pp. 30963-30969
Closed Access
In Pyo Hong, Rui He, Chung Wung Bark
Ceramics International (2024) Vol. 50, Iss. 17, pp. 30963-30969
Closed Access
Effect of Al doping on structural and electrical properties of HfO2/ZrO2 layered structures for high-k applications
Yu-Rim Jeon, Seungwon Lee, Yoonchul Shin, et al.
Journal of Alloys and Compounds (2024), pp. 177682-177682
Closed Access
Yu-Rim Jeon, Seungwon Lee, Yoonchul Shin, et al.
Journal of Alloys and Compounds (2024), pp. 177682-177682
Closed Access
Exploring the Morphotropic Phase Boundary in HfO2‐Based Ferroelectrics for Advanced High‐k Dielectrics
Seungyeol Oh, Hojung Jang, Mostafa Habibi, et al.
Advanced Materials Technologies (2024)
Closed Access
Seungyeol Oh, Hojung Jang, Mostafa Habibi, et al.
Advanced Materials Technologies (2024)
Closed Access
