OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Atomic surface of silicon wafers induced by grafted silica nanoparticles and sodium carbonate
Dong Hwan Wang, Wenxiang Xie, Zhenyu Zhang, et al.
Applied Surface Science (2024) Vol. 664, pp. 160234-160234
Closed Access | Times Cited: 13
Dong Hwan Wang, Wenxiang Xie, Zhenyu Zhang, et al.
Applied Surface Science (2024) Vol. 664, pp. 160234-160234
Closed Access | Times Cited: 13
Showing 13 citing articles:
Chemical mechanical polishing on GaN using a developed resin-metal plate through the aluminum contact corrosion
Jialong Lin, Da Hu, Da Hu, et al.
Materials Today Communications (2025) Vol. 42, pp. 111533-111533
Closed Access
Jialong Lin, Da Hu, Da Hu, et al.
Materials Today Communications (2025) Vol. 42, pp. 111533-111533
Closed Access
Chemical mechanical polishing on cobalt-based barrier through dual functionality of salicylhydroxamic acid between the removal of copper and corrosion inhibition
Yingqi Di, Guofeng Pan, Song Lv, et al.
Electrochimica Acta (2025) Vol. 514, pp. 145689-145689
Closed Access
Yingqi Di, Guofeng Pan, Song Lv, et al.
Electrochimica Acta (2025) Vol. 514, pp. 145689-145689
Closed Access
Characterizing the contact evolution through the combination of surface roughness parameters in chemical mechanical polishing using a polyurethane polishing pad
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access
Jongmin Jeong, Yeongil Shin, Seunghun Jeong, et al.
Wear (2025), pp. 205802-205802
Closed Access
Coupling Effect of Polishing Solution and Frictional Heat on the Surface Quality Properties of Titanium Alloy Materials
Yunlong Yao, Xiaokun Wei, Zhankui Wang, et al.
Materials Today Communications (2025), pp. 112185-112185
Closed Access
Yunlong Yao, Xiaokun Wei, Zhankui Wang, et al.
Materials Today Communications (2025), pp. 112185-112185
Closed Access
Quantitative analysis of the polishing performance of Wurtzite-SiC surface texture on surface quality and material removal rate
Tan-Tai Do, Phu-Cuong Le, Te‐Hua Fang
Tribology International (2024) Vol. 199, pp. 110020-110020
Closed Access | Times Cited: 2
Tan-Tai Do, Phu-Cuong Le, Te‐Hua Fang
Tribology International (2024) Vol. 199, pp. 110020-110020
Closed Access | Times Cited: 2
New skin corrosion effect of magnetorheological electro-Fenton polishing investigated by friction and wear experiments
Yangting Ou, Hao Wang, Yusen Wu, et al.
Materials Science in Semiconductor Processing (2024) Vol. 184, pp. 108759-108759
Closed Access | Times Cited: 2
Yangting Ou, Hao Wang, Yusen Wu, et al.
Materials Science in Semiconductor Processing (2024) Vol. 184, pp. 108759-108759
Closed Access | Times Cited: 2
Counterion-Driven Mechanochemical Reactions at TC4 Alloy/SiO2 Interfaces: Electrical Double Layer and Dynamic Ionic Radius
Jinwei Liu, Xin Zeng, Peng Zhang, et al.
Tribology Letters (2024) Vol. 73, Iss. 1
Closed Access | Times Cited: 1
Jinwei Liu, Xin Zeng, Peng Zhang, et al.
Tribology Letters (2024) Vol. 73, Iss. 1
Closed Access | Times Cited: 1
Study on the polishing performance and mechanism of sapphire wafers by different types of degradable surfactants
Yongchao Xu, Cheng Peng, Ningchang Wang, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104915-104915
Closed Access
Yongchao Xu, Cheng Peng, Ningchang Wang, et al.
Surfaces and Interfaces (2024) Vol. 52, pp. 104915-104915
Closed Access
Experimental Study of Key Factors on Super Smooth Surface Fabrication Upon Single Crystal Silicon Based on Mechanochemical Synergy
Xiao Shen, Xiaoyu Weng, Yancheng Li, et al.
Tribology International (2024) Vol. 201, pp. 110199-110199
Closed Access
Xiao Shen, Xiaoyu Weng, Yancheng Li, et al.
Tribology International (2024) Vol. 201, pp. 110199-110199
Closed Access
Towards atomic-scale smooth surface manufacturing of β-Ga2O3 via highly efficient atmospheric plasma etching
Yongjie Zhang, Yuxi Xiao, Jianwen Liang, et al.
International Journal of Extreme Manufacturing (2024) Vol. 7, Iss. 1, pp. 015105-015105
Open Access
Yongjie Zhang, Yuxi Xiao, Jianwen Liang, et al.
International Journal of Extreme Manufacturing (2024) Vol. 7, Iss. 1, pp. 015105-015105
Open Access
Double-Oxidant-Induced Slurry Reaction Mechanism and Performance on Chemical Mechanical Polishing of 4H-SiC (0001) Wafer
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
Xin Song, Boyu Hu, J. C. Guo, et al.
Langmuir (2024)
Closed Access
Zirconium and/or cerium-containing mesoporous silica as functional active abrasive particles for radical-facilitated chemical mechanical polishing
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
Study of the impact of flake Al2O3 abrasive and N-n-Butylimidazole in backside CMP (Chemical Mechanical Polishing) of TSV (Through Silicon Via) wafers
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access
Zhanjie Du, Ru Wang, Xuhua Chen, et al.
Surfaces and Interfaces (2024), pp. 105626-105626
Closed Access
