OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!
If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.
Requested Article:
Trivalent lanthanum and ytterbium doped meso-silica/ceria abrasive systems toward chemical mechanical polishing (CMP) and ultraviolet irradiation-assisted photochemical mechanical polishing (PCMP)
Zihan Kou, Chao Wang, Wenjin Zhou, et al.
Applied Surface Science (2024) Vol. 657, pp. 159733-159733
Closed Access | Times Cited: 11
Zihan Kou, Chao Wang, Wenjin Zhou, et al.
Applied Surface Science (2024) Vol. 657, pp. 159733-159733
Closed Access | Times Cited: 11
Showing 11 citing articles:
A review on the development of ceria for chemical mechanical polishing
Jiahui Ma, Ning Xu, Jie Cheng, et al.
Powder Technology (2024) Vol. 444, pp. 119989-119989
Closed Access | Times Cited: 10
Jiahui Ma, Ning Xu, Jie Cheng, et al.
Powder Technology (2024) Vol. 444, pp. 119989-119989
Closed Access | Times Cited: 10
Photocatalytic assisted chemical mechanical polishing for silicon carbide using developed ceria coated diamond core-shell abrasives
Xiaoxiao Zhu, Yuziyu Gui, Hao Fu, et al.
Tribology International (2024) Vol. 197, pp. 109827-109827
Closed Access | Times Cited: 9
Xiaoxiao Zhu, Yuziyu Gui, Hao Fu, et al.
Tribology International (2024) Vol. 197, pp. 109827-109827
Closed Access | Times Cited: 9
Scratching properties of 4H–SiC single crystal after oxidation under different conditions
Xinxing Ban, Zhuangzhi Tian, Shaodong Zheng, et al.
Wear (2024) Vol. 556-557, pp. 205503-205503
Closed Access | Times Cited: 3
Xinxing Ban, Zhuangzhi Tian, Shaodong Zheng, et al.
Wear (2024) Vol. 556-557, pp. 205503-205503
Closed Access | Times Cited: 3
Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping
Zhenyu Zhang, Ning Wang, Xingzi Wang, et al.
Applied Surface Science (2024), pp. 161236-161236
Closed Access | Times Cited: 2
Zhenyu Zhang, Ning Wang, Xingzi Wang, et al.
Applied Surface Science (2024), pp. 161236-161236
Closed Access | Times Cited: 2
Experimental study and DFT+U calculations on the impact of Rare-Earth ion (La3+, Sm3+, Y3+, Yb3+) doped CeO2 Core-Shell abrasives on polishing performance
Xiaodong An, Jilin Wang, Xin Tang, et al.
Applied Surface Science (2024) Vol. 676, pp. 161028-161028
Closed Access | Times Cited: 1
Xiaodong An, Jilin Wang, Xin Tang, et al.
Applied Surface Science (2024) Vol. 676, pp. 161028-161028
Closed Access | Times Cited: 1
Evaluation of chemical mechanical polishing characteristics using mixed abrasive slurry: A study on polishing behavior and material removal mechanism
X. Zhu, Juxuan Ding, Zhangchao Mo, et al.
Applied Surface Science (2024) Vol. 679, pp. 161157-161157
Closed Access | Times Cited: 1
X. Zhu, Juxuan Ding, Zhangchao Mo, et al.
Applied Surface Science (2024) Vol. 679, pp. 161157-161157
Closed Access | Times Cited: 1
Review on chemical mechanical polishing for atomic surfaces using advanced rare earth abrasives
X. Chen, Zhenyu Zhang, Feng Zhao, et al.
Journal of Physics D Applied Physics (2024) Vol. 58, Iss. 2, pp. 023004-023004
Closed Access | Times Cited: 1
X. Chen, Zhenyu Zhang, Feng Zhao, et al.
Journal of Physics D Applied Physics (2024) Vol. 58, Iss. 2, pp. 023004-023004
Closed Access | Times Cited: 1
Nanocasting synthesis of mesoporous CeO2 particle abrasives from mesoporous SiO2 hard templates for enhanced chemical mechanical polishing performance
Yang Chen, Yifan Xia, Chao Wang, et al.
Ceramics International (2024)
Closed Access | Times Cited: 1
Yang Chen, Yifan Xia, Chao Wang, et al.
Ceramics International (2024)
Closed Access | Times Cited: 1
Study on uniform size and spherical CeO2 abrasives synthesized by two-step method and their chemical mechanical polishing performances
Ning Xu, Yu Lin, Yuxin Luo, et al.
Materials Science in Semiconductor Processing (2024) Vol. 185, pp. 108920-108920
Closed Access
Ning Xu, Yu Lin, Yuxin Luo, et al.
Materials Science in Semiconductor Processing (2024) Vol. 185, pp. 108920-108920
Closed Access
Synthesis, characterization and CMP property of neat and doped mesoporous ceria as defective active particle abrasives
Yang Chen, Pingyang Li, Chao Wang, et al.
Surfaces and Interfaces (2024) Vol. 56, pp. 105614-105614
Closed Access
Yang Chen, Pingyang Li, Chao Wang, et al.
Surfaces and Interfaces (2024) Vol. 56, pp. 105614-105614
Closed Access
Zirconium and/or cerium-containing mesoporous silica as functional active abrasive particles for radical-facilitated chemical mechanical polishing
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
Zichen Tang, Yang Chen, Wenjin Zhou, et al.
Journal of Alloys and Compounds (2024), pp. 178090-178090
Closed Access
