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OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

Self-assembled monolayers as inhibitors for area-selective deposition: A novel approach towards resist-less EUV lithography
Jayant K. Lodha, Ivan Pollentier, Thierry Conard, et al.
Applied Surface Science (2022) Vol. 606, pp. 154657-154657
Open Access | Times Cited: 11

Showing 11 citing articles:

Blocking mechanisms in area-selective ALD by small molecule inhibitors of different sizes: Steric shielding versus chemical passivation
Pengmei Yu, Marc J. M. Merkx, Ilker Tezsevin, et al.
Applied Surface Science (2024) Vol. 665, pp. 160141-160141
Open Access | Times Cited: 13
Extreme ultraviolet lithography
Dimitrios Kazazis, Jara G. Santaclara, Jan van Schoot, et al.
Nature Reviews Methods Primers (2024) Vol. 4, Iss. 1
Closed Access | Times Cited: 13
Resistless EUV lithography: Photon-induced oxide patterning on silicon
Li‐Ting Tseng, Prajith Karadan, Dimitrios Kazazis, et al.
Science Advances (2023) Vol. 9, Iss. 16
Open Access | Times Cited: 8
Research progress of laser lithography
Wei‐Cheng Tian
Journal of Physics Conference Series (2023) Vol. 2608, Iss. 1, pp. 012016-012016
Open Access | Times Cited: 5
In situ differential atomic force microscopy (AFM) measurement for ultra-thin Thiol SAM patterns by area-selective deposition technique
Xinshuang Gao, Hongru Zhang, Li Shi, et al.
Surfaces and Interfaces (2024) Vol. 46, pp. 104133-104133
Closed Access | Times Cited: 1
Degradation of Perfluorododecyl-Iodide Self-Assembled Monolayers upon Exposure to Ambient Light
Lauren Colbeck Kirby, Jayant K. Lodha, Simon Astley, et al.
Nanomaterials (2024) Vol. 14, Iss. 11, pp. 982-982
Open Access | Times Cited: 1
Extending area selective deposition of ruthenium onto 3D SiO2-Si multilayer stacks
Kartik Sondhi, Rahul Sharangpani, Roshan J. Tirukkonda, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023) Vol. 41, Iss. 5
Closed Access | Times Cited: 3
Selective functionalization of silicon nitride with a water-soluble etch-resistant polymer
K. Mochida, Tsubasa Miki, Tadashi Teranishi
Microelectronic Engineering (2023) Vol. 276, pp. 112001-112001
Closed Access | Times Cited: 2
Area-Selective Atomic Layer Deposition of Ru Using Carbonyl-Based Precursor and Oxygen Co-Reactant: Understanding Defect Formation Mechanisms
Jayant K. Lodha, Johan Meersschaut, Mattia Pasquali, et al.
Nanomaterials (2024) Vol. 14, Iss. 14, pp. 1212-1212
Open Access
Area-Selective Molecular Layer Deposition of Alucone on Photoresist for Enhanced Pattern Transfer
Long Liu, Yue Zhang, Wenda Bao, et al.
Chemistry of Materials (2024)
Closed Access
Defect Mapping and Densification in Self-Assembled Monolayers of Octadecyltrichlorosilane on SiO<sub>2</sub>
Yasuharu Miyamoto, Yukifumi Yoshida, Toru Utsunomiya, et al.
Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena (2023) Vol. 346, pp. 216-221
Closed Access
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