OpenAlex Citation Counts

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OpenAlex is a bibliographic catalogue of scientific papers, authors and institutions accessible in open access mode, named after the Library of Alexandria. It's citation coverage is excellent and I hope you will find utility in this listing of citing articles!

If you click the article title, you'll navigate to the article, as listed in CrossRef. If you click the Open Access links, you'll navigate to the "best Open Access location". Clicking the citation count will open this listing for that article. Lastly at the bottom of the page, you'll find basic pagination options.

Requested Article:

The Importance of Decarbonylation Mechanisms in the Atomic Layer Deposition of High‐Quality Ru Films by Zero‐Oxidation State Ru(DMBD)(CO)3
Joel R. Schneider, Camila de Paula, Jacqueline Lewis, et al.
Small (2022) Vol. 18, Iss. 9
Open Access | Times Cited: 8

Showing 8 citing articles:

The surface chemistry of the atomic layer deposition of metal thin films
Francisco Zaera
Nanotechnology (2024) Vol. 35, Iss. 36, pp. 362001-362001
Closed Access | Times Cited: 2

Understanding and Utilizing Reactive Oxygen Reservoirs in Atomic Layer Deposition of Metal Oxides with Ozone
Joel R. Schneider, Camila de Paula, Nathaniel E. Richey, et al.
Chemistry of Materials (2022) Vol. 34, Iss. 12, pp. 5584-5597
Open Access | Times Cited: 12

Surface treatment of TaN for sub-2 nm, smooth, and conducting atomic layer deposition Ru films
Corbin Feit, Udit Kumar, Md. Rafiqul Islam, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2024) Vol. 42, Iss. 3
Open Access | Times Cited: 2

Low-temperature atomic layer deposition as an advanced fabrication technique of semiconductor polymer materials
William Chiappim, Benedito Donizeti Botan-Neto, Rodrigo Sávio Pessoa, et al.
Elsevier eBooks (2024), pp. 163-186
Closed Access | Times Cited: 1

Precursor design and cascade mechanism of RuO2·xH2O atomic layer deposition
Yongjia Wang, Chenqi Bai, Yongxiao Zhao, et al.
Applied Surface Science (2024) Vol. 657, pp. 159728-159728
Closed Access

Density functional theory study on reaction mechanisms of Co(tbu2DAD)2 for area selective-atomic layer deposition of Co films on metal surfaces
Nickolas Ashburn, Xiuyao Lang, Sumeet C. Pandey, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023) Vol. 41, Iss. 5
Closed Access | Times Cited: 1

Electron-enhanced atomic layer deposition of Ru thin films using Ru(DMBD)(CO)3 and effect of forming gas anneal
Michael A. Collings, Marcel Junige, Andrew S. Cavanagh, et al.
Journal of Vacuum Science & Technology A Vacuum Surfaces and Films (2023) Vol. 41, Iss. 6
Closed Access | Times Cited: 1

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